Maskless lithography - Burn Lin, senior director, Nanopatterning Technology, TSMC
Sessions will maximize discussion time, and attendees will be surveyed for their plans and preferences on lithographic approaches for future manufacturing. The survey will also assess how attendees perceive the development status of each option and its viability for the demands of large-scale manufacturing. Additional information is available at http://www.sematech.org.
Lithography is a capital-intensive process. A single piece of next-generation lithographic equipment is expected to cost in excess of $40 million. The risk embraces manufacturers and suppliers alike. For any single technology or approach to be considered commercially viable, at least two equipment suppliers must support it.
Lithography is a key process in the microfabrication of semiconductors. Light is used to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate surface. A series of chemical treatments engraves the exposure pattern into the material underneath the photoresist. A CMOS wafer, for example, will go through the photolithographic cycle up to 50 times.
SEMATECH works with members and partners on a pre-competitive basis to drive innovation from the lab through the manufacturing process. At the industry level, the organization plays a major role in arbitrating generational shifts by hosting industry-wide forums to foster dialogue and build consensus and helps maintain the International Technology Roadmap for Semiconductors (ITRS), a 15-year assessment of the industry’s future technology requirements.
For 20 years, SEMATECH (), the global consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D; to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.