submit news    HOME | FEEDBACK  


« NAVIGATION »
NEWS

- Bio/Medicine

- Chemicals

- Defense

- Drug Delivery

- Education

- Electronics

- Energy

- Events

- Grants

- Industry

- Investment

- Litigation

- Materials

- MEMS

- Nanofabrication

- Nanoparticles

- Nanotubes

- Optics

- Partnership

- Patent

- Products

- Quantum dots

- Research

- Smart Dust

- Software
COMPANIES
EVENTS

- Browse by Month

- Current Shows

- Previous Shows

- Submit Events
FEEDBACK
ADVERTISE
LINK TO US

« PARTNERS »
Become A Nanotechwire Partner

FEI Company

Veeco Instruments

Nano Science and Technology Institute

National Nanotechnology Initiative

Nanotechnology at Zyvex

Want to see your Company or Organization listed above? Become A Nanotechwire Partner Today - click here
« NEWSLETTER »



« SEARCH »







9/22/2010 8:47:34 AM
Ultratech Receives Multi-System Order for Laser Spike Annealing Systems From Major Logic Foundry for 40-nm Production Ramp

Ultratech, Inc., a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced that it has received a follow-on, multiple-system order for its laser spike annealing (LSA) tools from a major logic foundry in Asia. Ultratech's LSA100A systems will be used to support the production ramp of 40-nm logic devices in 2010. The LSA100A is the second generation of Ultratech's laser annealing production tools. The process uniformity and cost-of-ownership advantages of Ultratech's proprietary LSA technology have been demonstrated at all major logic foundries.

"This latest multi-system order confirms the LSA100A system as the millisecond annealing tool of choice for high-volume production at yet another major logic foundry," noted Jeff Hebb, Ph.D., vice president of laser product marketing at Ultratech. "The proprietary long-wavelength architecture of the LSA system continues to demonstrate excellent within-die uniformity, layout-independent process results, and real-time temperature control. These advantages contribute to enhanced yields and considerable cost savings for our foundry customers. Also, the inherent nature of our scanning LSA system and dwell time flexibility delivers a low stress process, enabling high-process temperatures, lower leakage, and minimal lithography overlay errors. As a result, the LSA100A provides our customers with added value for their 40-nm processes, while enabling extendibility to the 28-nm node and beyond."

Ultratech's LSA100A Laser Annealing System

The LSA100A laser spike annealing system enables junction activation and other front-end advanced annealing processes for the 65-nm node and beyond. Building on the success of its predecessor the LSA100, the LSA100A provides both an improvement in the technical capabilities for advanced nodes and a significant increase in productivity. Ultratech's LSA100A delivers uniform temperature across the wafer independent of the device layout while providing a low overall cost of ownership. LSA100A provides superior technical performance and operational flexibility critical for advanced semiconductor manufacturing.

Other Headlines from Ultratech ...
 - Ultratech Announces HB-LED Asia Technology Center in Taiwan
 - Ultratech Announces First Quarter 2011 Results
 - Ultratech Announces Fourth Quarter and Year-End 2010 Results
 - Ultratech Introduces Latest Generation Laser Annealing System for 28-nm Node and Beyond
 - Ultratech Introduces New Dual-Beam Laser Spike Anneal System

More Products Headlines ...
 - Nanologix introduces new "Petri Flat Pack", to exhibit at American Society for Microbiology annual meeting in New Orleans and unveils new website
 - Developing OLED Displays with CRAIC Technologies Microscope Spectrophotometers
 - Elec-Tech Places Order for Multiple MaxBright MOCVD Systems
 - Middle Tennessee State University Selects the TESCAN LYRA 3 FIB-SEM Workstation
 - STMicroelectronics Reveals Best-In-Class Technology Enabling Longer-Lasting Broadcast and Medical-Imaging Equipment


« Back To List »

« GET LISTED »
- submit company
- submit news
- submit events
- advertise here

« EVENTS »
- More Events


Copyright 2014 Nanotechwire.com | Privacy Policy |