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9/20/2010 11:04:15 AM
AMO GmbH decided in favour of the Vistec’s Electron-Beam Lithography System EBPG5200

Vistec Lithography, Inc., a leading supplier of advanced electron-beam lithography systems, announced today that AMO GmbH, a research service provider for nanotechnology located in Aachen (Germany), has placed an order for Vistec’s electron-beam lithography system EBPG5200.

AMO (Gesellschaft für Angewandte Mikro- und Optoelektronik mbH) as a research service provider holds designated competencies in several areas of nanotechnology as nanofabrication, nanoelectronics, nanophotonics and biotechnology. Beside research & development capacity AMO is able to offer the entire infrastructure required for nanotechnology, in which electron-beam lithography plays a decisive role. With the new Vistec EBPG5200 a highly flexible and reliable patterning system will be available for nanofabrication services.

The Vistec EBPG5200 is the latest version of the highly successive and field-proven EBPG electron-beam lithography tool series. The EBPG5200 system can be operated with 20, 50 and 100kV accelerating voltage and is equipped with a 50MHz pattern generator and full 20bit address technology. With the EBPG5200 Vistec offers true 100kV/ 1mm performance under regular electron-optical conditions.

Thanks to further enhancements in resolution, noise reduction and beam stability, the Vistec EBPG5200 is set to routinely generate structures less than 8nm on varying substrates sizes from piece parts of a few millimetres to full patterning across a 200mm diameter. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse “multi user environments”.

Dr. Christian Moormann, Managing Director of AMO GmbH, stated: "High end electron beam lithography is the basic technology for all our activities in nanophotonics, electronics and nanoimprint. We decided to base our flexible nanotechnology R&D services again upon a Vistec electron beam lithography system because performance and service were convincing. We believe in the high quality of EPBG5200 even in rugged environmental situations and enlarge our capabilities significantly with the new system."

Commenting on today's announcement, Rainer Schmid, General Manager at Vistec Lithography, Inc. noted: "With the EBPG5200 at AMO a long lasting and fruitful collaboration between the two companies further continues. Customers like AMO help us to supply systems, which fit best to the challenging requirements of nanopatterning today and in future."

AMO GmbH is a global acting research company identifying potentials of nanofabrication for industrial processes in information technology, bio technology and photonics. Key assets are nanofabrication technology solutions to realise new electronic and photonic devices from development to prototype or small volume manufacturing level. Based on a high level research staff with expertise in CMOS process technology AMO provides leading edge R&D infrastructure and offers consulting, prototyping and production of nanostructures for researchers, SMEs up to large scale industry.

Vistec Electron Beam Lithography Group:

The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments like mask making or direct writing for fast prototype development and design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography.

Vistec Lithography:

Vistec Lithography develops, manufactures, and sells electron-beam lithography equipment based on Gaussian Beam technology. Their electron-beam systems are world-wide accepted in advanced research laboratories and universities. The company is located in Watervliet, NY (USA), within the Capital Region of New York.

Vistec Electron Beam:

Vistec Electron Beam is providing electron-beam lithography equipment based on Shaped Beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron-beam systems are used for microchip production and integrated optics as well as for scientific and commercial research. The company is located in Jena (Germany).

Other Headlines from Vistec ...
 - Australian Institute Welcomes Vistec Electron Beam Technology
 - National Science Center of Greece Selects Nano-Research Technology from Vistec
 - ETH Zurich Choose Vistec EBPG5200 for New Nanotechnology Center
 - Sabanci University in Istanbul Orders Electron-Beam Lithography System from Vistec
 - Vistec Announces New Technology for Its Electron-Beam Lithography Systems

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